Summary:

In this insightful video, JP and Jamie engage in a deep dive into the critical concept of source control in combating PFAS contamination. They emphasize the importance of implementing measures and strategies to prevent the release or minimize the generation of PFAS contaminants at their origin points. By targeting sources such as industrial facilities, firefighting training areas, landfills, and wastewater treatment plants, source control offers a proactive approach to addressing PFAS pollution. JP and Jamie highlight the merits of this approach, which include reducing environmental exposure, protecting public health, and mitigating the long-term impacts of PFAS contamination on ecosystems. Through their expert analysis and engaging discussion, JP and Jamie underscore the significance of prioritizing source control in comprehensive PFAS management strategies.

Subject Matter Experts:

EA – JP Verhuel – Headshot – 060223

JP Verheul

JP Verheul is a Senior Chemist and the Business Development Manager for Enthalpy Analytical, LLC’s environmental laboratory in Richmond, VA. He holds a B.S. in Chemistry from the College of William and Mary, and has more than 18 years’ experience with analytical chemistry for environmental samples. Currently, JP works to evaluate market trends to help optimize analytical programs, and routinely supports complex projects from various industries, including solid waste, landfill gas and biogas, commercial and industrial wastewater monitoring, drinking water supply, air emissions, site assessment and remediation, and emerging contaminants.

Jamie Fox

Jamie Fox

Jamie Fox is a career analytical chemist with over 25 years of experience supporting environmental laboratory services as an analyst, data validator, laboratory auditor, project manager, laboratory director, and business development. His expertise lies in the ultra-trace analysis of persistent organic pollutants using high resolution GC-MS and LC-MS/MS. He has a B.S. in Biochemistry from the University of Missouri-Columbia.